Hi,

I'm raytracing an integrated circuit layout with metal isolated by oxide 
layers on top of a silicon wafer. The oxide layers are planarized so the 
metal layers will always have the same distance to the silicon regardless 
of what might be below. However, the top oxide layer is not planarized so 
this layer should follow the profile of the top metal layer. 

Here is an ASCII-art sketch of the top layer:

      /-----------------.
_____/ |""""""""""""""|  `___________
_______|              |_____________
              Metal

My first solution was to make a heightfield of the chip without the top 
oxide layer with Povray and then smooth it with HF-Lab. The problem with 
this approach was that after smoothing the metal edges were visible through 
the oxide. 

The right thing to do it seems is to displace the heightfield in the 
direction of the normal so the surface of the oxide will have a constant 
distance to the surface below. 

Now to my question. Can this be done in Povray? Or maybe in some 
heightfield tool like HF-Lab.

Best regards,

Henrik Johansson

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