Dan Connelly <djc### [at] yahoocom> wrote:
> Their use of compressed GeSi alloy to induce uniaxial strain in the
> p-channel transistors, along with continued improvement in n-channel
> performance, then integrating metal gates, has really driven
> performance to levels previously unanticipated.

  Did you just made up that technobabble on the spot? ;)

-- 
                                                          - Warp

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